Nanoscale Characterization and Development
of Ultra Low-k Dielectric Xerogel Films
NSF: Grant Opportunities for Academic Liaison with Industry
(GOALI)
Division of Materials Research Grant #0316916
Logo was created using a FIB on a silicon wafer (Moon Kim)
Investigators: R.F. Reidy*, M.J. Kim**, D.W. Mueller*,
P.D. Matz***
*University of North Texas, **University
of Texas-Dallas, ***Texas Instruments
from left to right: Phil Matz of Texas Instruments (its his wafer so he
gets to hold it),
Dennis Mueller, Rick Reidy and Moon Kim
Research Mission: To meet demands
for faster, smarter, and smaller electronic devices, the semiconductor industry
must continue to shrink features in integrated circuits. As metal connections
within microcircuits become thinner and closer together, better insulators
must be developed. Improving insulating capabilities requires the incorporation
of pores into these materials, consequently, weakening the films. This
work focuses on understanding the properties of these porous low-k materials
and on developing methods of enhancing their strength to withstand assembly
and everyday use.
Educational Mission: To provide an integrated
academic and industrial experience for our students and postdoctoral researchers.
In our first year, one undergraduate (Janet Trammell), four graduate students
(Rosa Orozco-Teran, Zhengping Zhang, Pawan Nerusu, Dongkyu Cha, Poonam Kadam),
and one research scientist (Pete Capani) have contributed to this work. Students
regularly meet and discuss relevant project issues with faculty and Dr. Matz
of Texas Instruments maintaining awareness of industrial priorities. Three
students from the Texas Academy of Mathematics and Science (TAMS) (Michael
Lin, Eugene Cheung, and David Lin) are also be working on this effort.
Educational Developments: Zhengping Zhang graduated with his PhD
in May of 2004 and currently works at Ferro, Inc. developing CMP materials and
methods. Rosa Orozco-Teran had a summer internship at Texas Instruments in
2004, defended her PhD thesis, and joined Texas Instruments as a full time
employee in February 2005.
Dr. Matz became an adjunct professor of Materials Science and Engineering
at UNT so that he could be a member of student thesis committees.
Outreach Developments: In addition to TAMS involvement, plans
are underway to conduct demonstrations at a local high school and at a local
elementary program. The investigators have given several interviews for articles
in the Dallas-Fort Worth media and spoken for local business groups discussing
the importance of semiconductor challenges and advancements in nanotechnology.
Dr. Reidy testified to a Congressional hearing of the House Subcommittee
on Research (Sciecne Committee). His testimony
stressed the need for teacher re-education and community educational outreach
to meet the needs of a future nanotechnology workforce.
Recent Publications:
- Supercritical Silylation of Ashed Si-O-C Low-K
Films to Limit Changes in Critical Dimensions, R.F. Reidy, R.A.
Orozco-Teran, Zhengping Zhang, Pawan K. Nerusu, P.D. Matz, D.W. Mueller, Advanced
Metallization Conference, ed. G.W. Ray, T. Smy, T. Ohta, M. Tsujimura, 2003,
p. 513-518.
- Rapid Repair of Plasma Ash Damage in Low-k
Dielectrics Using Supercritical CO2, B.P. Gorman, R.A. Orozco-Teran,
Z. Zhang, P.D. Matz, D.W. Mueller, and R.F. Reidy, Journal of Vacuum Science
and Technology B, 22, 3 (2004) 1210-1212.
- Copper Ion Behavior in Silica Xerogels, Zhengping
Zhang, Hanjiang Dong, B.P. Gorman, D.W. Mueller, and R. F. Reidy, Journal
of Non-Crystalline Solids, 341 (2004) 157-161
- Reinforcement Mechanism for Mechanically-Enhanced
Xerogel Films, Hanjiang Dong, B.P. Gorman, Zhengping Zhang, R.A. Orozco-Teran, J.A. Roepsch, D.W. Mueller, M.J. Kim, R.
F. Reidy, Journal of Non-Crystalline Solids, 350 (2004) 345-350
- Supercritical Pore Sealing of Porous MSQ, R.F. Reidy, P.K. Nerusu, E.C. Chaung, R.A. Orozco-Teran, P.P. Kadam,
P.D. Matz, J.T. Rhoad, E.L. Busch, D.W. Mueller, Advanced Metallization Conference,
ed. D. Erb, P. Ramm, K. Masu, A. Osaki, 2004 p.493-497.
- Drying Methods for Low-κ Films and Their Effects on Dielectric Constants, P.M. Capani, B.P. Gorman, R.F. Reidy, D.W. Mueller, E.R. Walter, P. D. Matz
J.T. Rhoad, E.L. Busch, Advanced Metallization Conference 2004, ed. D. Erb, P.
Ramm, K. Masu, A. Osaki, p.509-513.
- Effect of silylation on triethoxyfluorosilane xerogel
films by means of atmospheric pressure drying, R. A. Orozco-Teran, B. P.
Gorman, D. W. Mueller, M. R. Baklanov and R. F. Reidy, Thin Solid Films,
471, 1-2 (2005) 145-153
- Supercritical CO2 Applications in BEOL Cleaning, P.D. Matz and R.F. Reidy, Solid State Phenomena
103-104 (2005) 315-322.